Nano – Micro – Lithography Symposium, June 30th 2021

The summer edition of our joint Symposium will once again be held in the form of a virtual event.
Our technical experts as well as our customers will present the latest, state-of-the-art developments in direct-write Nano-Micro-Lithography, including technology, materials, and applications. The users of our products will provide detailed insights into their projects and experiences. 

When: June 30th 2021, starting at 10 am CEST
Where: Online on - the event link will be provided closer to the event date.

Using as a virtual event platform will allow you to attend all presentations in conference rooms, to meet individual representatives from each company, and talk to with other participants.
Use this opportunity to find inspirations and innovative ideas for your projects, meet our sponsors, and discuss your microfabrication applications and plans with us.

Event schedule and speakers of the symposium

10:00 - Opening Remarks
Nils Goedecke, Heidelberg Instruments Nano AG

10:10 - Dynamic Precision Printing - 3D printing with optimal balance between precision and speed
Jochen Zimmer, Nanoscribe

10:40 - Fabrication and functionalization of cell-mimicking scaffolds
Ada-Ioana Bunea, DTU Nanolab, Denmark (Partner of Nanoscribe)

11:10 - Direct Write Lithography as an alternative to Mask based Steppers
Niels Wijnaendts van Resandt, Heidelberg Instruments Mikrotechnik GmbH

11:40 - Break / Networking & Virtual Exhibition

12:30 - “If you cannot measure it, you cannot improve it.” – Automation of SEM Metrology
Ulrich Hofmann, GenISys GmbH

13:00 - Maskless Lithography in Research and Education and it’s Special Role for Wafer Bonding Technologies
R. Knechtel, M. Wenig, University of Applied Sciences Schmalkalden (Partner of Heidelberg Instruments Mikrotechnik GmbH)

13:30 - Multi-material-multi-photon 3D printing with fast in-situ material replacement
Robert Kirchner, Technische Universität Dresden, Institut für Halbleiter- und Mikrosystemtechnik
(Partner of micro resist technology GmbH)

14:00 - Nano & Micro Lithography – perspectives of a material supplier
Anja Voigt & Jan J. Klein, micro resist technology GmbH

14:30 - Break / Networking & Virtual Exhibition

15:00 - Universal Ion Sources for FIB nanofabrication on a lithography platform
Torsten Richter, Raith GmbH

15:30 - Plasmonic Libraries with double gradient arrays, varying both pitch and feature size
Iliyana Samardzhieva, University of Glasgow (Partner of GenISys)

16:00 - Open discussion

16:30 - Closing Remarks / End
Nils Goedecke, Heidelberg Instruments Nano AG

Download the program as PDF.

To arrange a personal meeting in advance, please click here for an individual time slot.

Should you have already registered for the event, please click here to participate.

Please fill out the form below to register for the symposium.