The MNE2020 Conference in Leuven/ Belgium had to be cancelled due to the COVID-19 pandemic. Even more, we are happy to be part of MNE 2021 conference to take place in Torino, Italy from September 20th - 23rd. Besides supporting MNE 2021 as a gold sponsor, Heidelberg Instruments will be part of the conference program and participate in the accompanying exhibition. 

Following the successful workshop within the framework of MNE 2019, we are organizing in cooperation with GenISys, micro resist technology and Multiphoton Optics a technical workshop on

Maskless Laser Lithography and Direct Writing

for Nano- and Microfabrication

Date: Monday, Sept. 20th, 2021, 2:00 pm  - 5:30 pm (CEST)

Venue: Lingotto Convention and Exhibition Center, Torino, Italy

Join us  - in-person or online - and get deep insights into latest developments and advances in maskless laser lithography and direct writing, and discuss with the technical experts and users from the academia your product, software and material requirements in nano- and microfabrication for the creation of 2D and complex 2.5 and 3D structures in micro-optics, photonics, microfluidics and nanobiotechnology, electronics and communication technology, and in materials science - no matter how challenging. 

The participation is free of charge.

Agenda

2:00 pm    Welcome and Introduction

2:10 pm    Advances in Direct Write Lithography
                      Dr Daniel-Alexander Braun, Heidelberg Instruments Mikrotechnik GmbH, Germany

2:30 pm   Moving towards maskless fabrication of quantum sensors
                     Dr Patryk Krzysteczko, Physikalisch-Technische Bundesanstalt, Germany

2:50 pm   Insights in photoresist chemistry for greyscale lithography
                     Dr Christine Schuster, micro resist technology GmbH, Germany

3:10 pm   Additive manufacturing of microoptics via 3D Laser Lithography
                     Willi Mantei, Multiphoton Optics GmbH, Germany

3:30 pm   Coffee break & networking

3:40 pm   Laser Lithography Simulation and Correction Software
                    Nezih Unal, Aditya Reddy, GenISys GmbH, Germany

4:00 pm   Bend the curve: The benefit of optical proximity correction in laser direct write lithography    
                     Helmut Schift, Jan Erjawetz, Paul-Scherrer Institut (PSI), Switzerland

4:30 pm   NanoFrazor - A Nanofabrication tool for 2D & 3D Devices
                     Dr Felix Holzner, Heidelberg Instruments Nano AG, Switzerland

4:50 pm   Advances on thermally assisted magnetic nanolithography and applications 
                    Edoardo Albisetti, Politecnico di Milano, Italy

5:10 pm  Summary & Open Discussion

5:30 pm  Closing

Download the program as PDF. For any questions please contact us.

At the same time we would like to draw your attention to the BEAMeeting MNE 2021 organized by GenISys in the morning of Sept. 20th (in-person and online). This meeting is offering an optimal platform to discuss and exchange experience with e-beam and laser exposure tool users. More details can be found here.


Please follow this link to register for the Online Workshop.

 

To register for the In-Person event, please fill out the form below.