Nano – Micro – Lithography Symposium, November 4th 2021

Following the great success of the last two times, the fall edition of our joint symposium will again take the form of a virtual event. Our technical experts as well as our customers will present the latest state-of-the-art developments in Nano-Micro-Lithography, including technology, materials, and applications. Users of our systems will provide detailed insights into their projects and experiences.

When: November 4th 2021, starting at 8.30 am CET
Where: Online on gather.town – the event link will be provided closer to the event date.

Thanks to the interactive platform gather.town, you have the opportunity to attend presentations in conference rooms, meet all the participating companies at their booths or network with other participants while strolling through the event rooms. Take the chance to get inspiration and innovative ideas for your projects and discuss your microfabrication applications and plans with us.

Please make sure to read our short guide about the NML Symposium here.

Event schedule and speakers of the symposium

8:00 CET	Access to gather.town
8:30 CET	Welcome & organizational hints
8:40 CET 8:40 9:05 9:30 9:55 10:20 10:45	Session 1 e-Beam and Laser Lithography Simulation – pushing the limits of nanofabrication Dr. Thomas Michels, GenISys Fabrication of photonic and optomechanical circuits with BEAMER and RAITH VOYAGER EBL Erik Holmgren, AlbaNova Nanolab, KTH Rapid prototyping and production of 3D mechanical microparts Dr. Benjamin Richter, Nanoscribe Two-Photon 3D-printed structure on capillary tip for micromanipulation and fluid manipulation Antoine Barbot, femto-st Matching lithography processes to implement hierarchical nano-micro-pattern Johannes Wolf, micro resist technology Challenges for integration of optical elements Dr. Danny Reuter, Zentrum für Mikrotechnologien, TU Chemnitz
11:10 CET	Networking Visiting booths & exchange of thoughts
12:00 CET	Lunch break
13:00 CET	Students project pitch 15 undergraduate and graduate students present inspiring topics. Each speaking very concisely about project idea, microfabrication task, and key innovation.
14:00 CET 14:00 14:25 14:50 15:15	Session 2 Maskless grayscale lithography Dominique Collé, Heidelberg Instruments Mikrotechnik Cleanroom in a Glovebox Professor Kenneth Burch, Boston College The new EBPG Plus: E-Beam Lithography applications with a Plus in Throughput and Precision Frank Nouvertné, Raith GmbH Germany Large area x-ray gratings for space, meta lenses and Quantum devices on 2D materials – a wide range of cutting edge applications for EBL at Penn State Chad Eichfeld, Penn State University
15:40 to 15:45 CET	Concluding remarks and farewell
15:45 to 16:15 CET	Networking & visiting booths
16:15 CET	Event finds to its end

Download the program as PDF.

To arrange a personal meeting in advance, please click here for an individual time slot.

Should you have already registered for the event, please clicke here to participate.

Please fill out the form below to register for the symposium.