Nano – Micro – Lithography Symposium, November 4th 2021

Following the great success of the last two times, the fall edition of our joint symposium will again take the form of a virtual event. Our technical experts as well as our customers will present the latest state-of-the-art developments in Nano-Micro-Lithography, including technology, materials, and applications. Users of our systems will provide detailed insights into their projects and experiences. 

When: November 4th 2021, starting at 8.30 am CET
Where: Online on – the event link will be provided closer to the event date.

Thanks to the interactive platform, you have the opportunity to attend presentations in conference rooms, meet all the participating companies at their booths or network with other participants while strolling through the event rooms. Take the chance to get inspiration and innovative ideas for your projects and discuss your microfabrication applications and plans with us.

Please make sure to read our short guide about the NML Symposium here.

Event schedule and speakers of the symposium

8:00 CET

Access to

8:30 CET

Welcome & organizational hints

8:40 CET









Session 1

e-Beam and Laser Lithography Simulation – pushing the limits of nanofabrication
Dr. Thomas Michels, GenISys

Fabrication of photonic and optomechanical circuits with BEAMER and RAITH VOYAGER EBL 
Erik Holmgren, AlbaNova Nanolab, KTH

Rapid prototyping and production of 3D mechanical microparts
Dr. Benjamin Richter, Nanoscribe

Two-Photon 3D-printed structure on capillary tip for micromanipulation and fluid manipulation
Antoine Barbot, femto-st

Matching lithography processes to implement hierarchical nano-micro-pattern
Johannes Wolf, micro resist technology

Challenges for integration of optical elements
Dr. Danny Reuter, Zentrum für Mikrotechnologien, TU Chemnitz

11:10 CET

Visiting booths & exchange of thoughts

12:00 CET

Lunch break

13:00 CET

Students project pitch
15 undergraduate and graduate students present inspiring topics. Each speaking very concisely about project idea, microfabrication task, and key innovation.

14:00 CET





Session 2

Maskless grayscale lithography
Dominique Collé, Heidelberg Instruments Mikrotechnik 

Cleanroom in a Glovebox
Professor Kenneth Burch, Boston College

The new EBPG Plus: E-Beam Lithography applications with a Plus in Throughput and Precision
Frank Nouvertné, Raith GmbH Germany

Large area x-ray gratings for space, meta lenses and Quantum devices on 2D materials – a wide range of cutting edge applications for EBL at Penn State
Chad Eichfeld, Penn State University

15:40 to 15:45 CET

Concluding remarks and farewell

15:45 to 16:15 CET

Networking & visiting booths

16:15 CET

Event finds to its end 


Download the program as PDF.

To arrange a personal meeting in advance, please click here for an individual time slot.

Should you have already registered for the event, please clicke here to participate.

Please fill out the form below to register for the symposium.