Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19th to 23rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly organize the 2022 edition of their traditional technical workshop on


Maskless Laser Lithography for Advanced Micro- and Nanofabrication


Date:             Monday, Sept. 19th, 2022, 2:00 pm - 5:45 pm (CEST)

Venue:         KU Leuven, Gasthuisberg Academic Campus in Leuven, Belgium

Conference Room VESALIUS 07.200 / 7th Floor


The workshop will be again organized in a hybrid format: Join us in-person or online and get deep insights into latest developments and advances in maskless laser lithography and direct writing for advanced micro and nanofabrication. Discuss with technical experts and users from the academia your product, software and material requirements for the fabrication of 2D and complex 2.5 and 3D structures in micro-optics, photonics, microfluidics and nanobiotechnology, electronics and communication technology, and in materials science.





  2:00 pm Welcome
  2:10 pm

LAB14 the Innovation Lab for Micro- and Nanofabrication
Martin Wynaendts, LAB14 GmbH, DE

  2:30 pm

Advances in Direct Write Lithography
Dr. Daniel-Alexander Braun, Heidelberg Instruments Mikrotechnik GmbH, DE

  2:50 pm Additive manufacturing via 3D Laser Lithography
Dr. Benedikt Stender, Multiphoton Optics GmbH, DE 
  3:10 pm Rule OPC for Process and Fidelity Correction
Daniel Ritter, GenISys GmbH, DE
  3:30 pm Laser Direct Write of photonic IC.
Holger Sailer, Institut für Mikroelektronik Stuttgart (IMS Chips), DE
  3:50 pm Coffee Break & Networking
  4:10 pm Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication
Dr. Arne Schleunitz, micro resist technology GmbH, DE 
  4:30 pm Hybrid 3D structuring by direct write lithography and thermal nanoimprint
Helmut Schift, Paul Scherrer Institute (PSI), CH     
  4:50 pm 30 years of ‘hot-nanotip’ technologies … and counting
Prof. Jürgen Brugger, Microsystems Laboratory EPFL Lausanne, CH
  5:10 pm                  
Pushing the limits of thermal probe lithography with the NanoFrazor
Dr. Simon Bonanni, Heidelberg Instruments Nano AG, CH
  5:30 pm     Summary & Open Discussion
  5:45 pm     Closing  


To participate, please register below.

Please remember to choose between in-person and online participation.



For the interested community of e-beam technology and laser exposure tool users
GenISys is organizing the BEAMeeting MNE-ES 2022 - Leuven, Belgium in the morning of Sept. 19th, from 9:00 am to 12:30 pm CEST (in-person and online). More details/ registration here.