Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19^th to 23^rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly organize the 2022 edition of their traditional technical workshop on

Maskless Laser Lithography for Advanced Micro- and Nanofabrication

Date: Monday, Sept. 19^th, 2022, 2:00 pm - 5:45 pm (CEST)

Venue: KU Leuven, Gasthuisberg Academic Campus in Leuven, Belgium

Conference Room VESALIUS 07.200 / 7^th Floor

The workshop will be again organized in a hybrid format: Join us in-person or online and get deep insights into latest developments and advances in maskless laser lithography and direct writing for advanced micro and nanofabrication. Discuss with technical experts and users from the academia your product, software and material requirements for the fabrication of 2D and complex 2.5 and 3D structures in micro-optics, photonics, microfluidics and nanobiotechnology, electronics and communication technology, and in materials science.

To participate, please register below.

Please remember to choose between in-person and online participation.

For the interested community of e-beam technology and laser exposure tool users
GenISys is organizing the BEAMeeting MNE-ES 2022 - Leuven, Belgium in the morning of Sept. 19^th, from 9:00 am to 12:30 pm CEST (in-person and online). More details/ registration here.

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	2:00 pm	Welcome
	2:10 pm	LAB14 the Innovation Lab for Micro- and Nanofabrication Martin Wynaendts, LAB14 GmbH, DE
	2:30 pm	Advances in Direct Write Lithography Dr. Daniel-Alexander Braun, Heidelberg Instruments Mikrotechnik GmbH, DE
	2:50 pm	Additive manufacturing via 3D Laser Lithography Dr. Benedikt Stender, Multiphoton Optics GmbH, DE
	3:10 pm	Rule OPC for Process and Fidelity Correction Daniel Ritter, GenISys GmbH, DE
	3:30 pm	Laser Direct Write of photonic IC. Holger Sailer, Institut für Mikroelektronik Stuttgart (IMS Chips), DE
	3:50 pm	Coffee Break & Networking
	4:10 pm	Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication Dr. Arne Schleunitz, micro resist technology GmbH, DE
	4:30 pm	Hybrid 3D structuring by direct write lithography and thermal nanoimprint Helmut Schift, Paul Scherrer Institute (PSI), CH
	4:50 pm	30 years of ‘hot-nanotip’ technologies … and counting Prof. Jürgen Brugger, Microsystems Laboratory EPFL Lausanne, CH
	5:10 pm	Pushing the limits of thermal probe lithography with the NanoFrazor Dr. Simon Bonanni, Heidelberg Instruments Nano AG, CH
	5:30 pm	Summary & Open Discussion
	5:45 pm	Closing