Join us for the Technical Workshop in Berlin, Germany!

After Rhodes (2019), Turin (2021) and Leuven (2022), the 49th edition of MNE International Conference on Micro- and Nano Engineering will take place in Berlin in September 2023. The MNE is the flagship event of the International Society for Micro- and Nanotechnology (iMNEs) bringing together researchers and experts from all over the world to meet and discuss the latest research results in micro- and nanofabrication, manufacturing techniques, as well as applications of the fabricated micro/nanostructures, devices and microsystems into electronics, photonics, energy, environment, chemistry, and life sciences.

It is already tradition, that Heidelberg Instruments, GenISys and micro resist technology invite the interested community to join the free technical workshop on advanced micro- and nanofabrication techniques enabled by 

Maskless Laser Lithography for the Advanced Micro- and Nanofabrication.

Date: Monday, Sept. 25th, 2023, 13:30 - approx. 17:30 h (CEST)

Venue: Mercure Hotel MOA Berlin, Germany, Room MOA 4/5

For those unable to make it to Berlin, we will also stream the event online.

Get deep insights into latest developments and learn more about the advantages offered by maskless laser lithography and direct write technology for your micro- and nanofabrication projects. Discuss with technical experts and users from the academia your product, software and material requirements for the fabrication of 2D and complex 2.5 and 3D structures in micro-optics, photonics, microfluidics and nanobiotechnology, electronics and communication technology, and in materials science.



Daniel-Alexander Braun, Heidelberg Instruments Mikrotechnik GmbH


Overview and Introduction of the new VPG 300 DI Maskless Stepper
Sven Preuss, Heidelberg Instruments Mikrotechnik GmbH


Characterization and simulation of a maskless direct write lithography process for the formation of hybrid bond interconnects and re-distribution layers
Frank Windrich, Fraunhofer Institute for Reliability and Microintegration IZM
ASSID - Center All Silicon System Integration Dresden


BEAMER strategies to improve MLA pattern fidelity
Monserrat Alvarez, GenISys GmbH


Coffee Break and Networking


Hybrid Polymers: Versatile High-Performance Materials
Maria Russew, micro resist technology GmbH


Advanced 3D Lithography for additive microfabrication
Fabian Hilbert, Heidelberg Instruments Mikrotechnik GmbH


NanoFrazor® technology: enabling advanced nanodevices and unique applications
Jana Chaaban, Heidelberg Instruments Nano AG


Fully automated thermal scanning probe lithography for FET batch fabrication     
Dr. Armin Knoll, IBM Research Europe, Zurich                                     


Summary & Open discussion


Closing Remarks

Event notice
For the interested community of e-beam technology and laser exposure tool users, GenISys is organizing the BEAMeeting MNE 2023 - Berlin, Germany in the morning of Sept. 25th, from 9:00 h to 12:30 h CEST.

More details/registration here.


This event has ended. Thank you for your interest.