The 50th Edition of the International Conference on Micro- and Nano Engineering (MNE) will take place in Montpellier, France in September 2024.
The MNE conference, organized by the International Society for Micro- and Nanotechnology (iMNEs), is the premier international event for micro- and nanofabrication, manufacturing techniques, and applications in various fields such as electronics, photonics, energy, and life sciences. It gathers global researchers and experts to discuss the latest advancements and aims to promote and train young talent in micro and nano engineering.
The traditional workshop ahead the MNE 2024 jointly organized by Heidelberg Instruments Mikrotechnik, GenISys and micro resist technology on
Maskless Laser Lithography and Direct Write Technology for the Advanced Micro- and Nanofabrication
aims bringing together the lithography community – technical experts and users - to foster the exchange and discussion of the latest results in advanced micro- and nanofabrication techniques enabled by maskless lithography and direct-write technologies. Don’t miss this unique platform and register now!
| When | Monday, September 16, 2024, 13:30 – approx. 17:45 (CEST) |
| Where | Le Corum, Montpellier, France (Room BARTHEZ) |
| Cost | The workshop is free of charge. |
Coffee, drinks, and snacks will be provided.
There will be a "40 Years Heidelberg Instruments & New NanoFrazor" evening reception on Tuesday, September 17, starting at 6 p.m. in the "Bar à Tartines" at Le Corum Montpellier.
Below the agenda you can register for both the workshop and the reception or just for one of the two.
Agenda
| 13:30 | Welcome & introduction Daniel-Alexander Braun, Heidelberg Instruments Mikrotechnik, Heidelberg, Germany |
| 13:40 | The new NanoFrazor, modular and 10 times faster Simon Bonanni, Heidelberg Instruments Nano, Zurich, Switzerland |
| 14:05 | Inducing non-homogeneous strain on MoS2 via grayscale t-SPL Georgio Zambito, The University of Genoa, Italy |
| 14:30 | From diffractive optical elements to microlenses: Our journey with the MPO 100 3D lithography system Daniel Klenkert, Technical University of Deggendorf, Deggendorf, Germany |
| 14:55 | Laser direct imaging breaks new ground: Structuring of film thicknesses up to 20 μm for microelectronics Lynn Ratajczak, Fraunhofer Institute for Ceramic Technologies and Systems IKTS, Dresden, Germany |
| 15:20 | Coffee break & networking |
| 15:50 | From standard products over professional curve bending to rapid prototyping - The DWL 66+ at XRnanotech Jan Erjawetz, XRnanotech, Untersiggenthal, Switzerland |
| 16:15 | Automatic generation and write (exposure) optimization for DOEs Jörg Günther / Nezih Unal, GenISys, Taufkirchen, Germany |
| 16:40 | Innovative photoresists & polymers enabling advanced manufacture of photonic and micro-optical applications Anja Voigt, Maria Russew, Arne Schleunitz, micro resist technology, Berlin, Germany |
| 17:05 | Summary / closing remarks |
| 17:15 | End of workshop |